The structural homogeneity of boron carbide thin films fabricated using plasma-enhanced chemical vapor deposition from B5H9+CH4

Optical properties of boron carbide (B5C) thin films fabricated by plasma-enhanced chemical-vapor deposition

Characterization of boron carbide thin films fabricated by plasma enhanced chemical vapor deposition from boranes

A Review on Titanium Nitride and Titanium Carbide Single and Multilayer Coatings Deposited by Plasma Assisted Chemical Vapor Deposition

In this paper, we reviewed researches about the titanium nitride (TiN) and titanium carbide (TiC) single and multilayer coatings. These coatings were deposited by the plasma assisted chemical vapor deposition (PACVD) technique. Plasma-based technologies are used for the processing of thin films and coatings for different applications such as automobile and aerospace parts, computer disc drives,...

Amorphous silicon carbide thin films deposited by plasma enhanced chemical vapor deposition at different temperature for hard environment applications

PECVD technology was used for deposition of a-SiC:H films at different temperature from SiH4 and CH4 gas mixture. A P-type silicon wafer with resistivity 2-7 cm and (100) orientation was used as the substrate for the growth of SiC films. Irradiation of samples by fast neutrons with fluence 1.4x10 14 cm -2 was used. Raman band feature intensity decreasing after neutron irradiation. The measured ...

The incorporation of Nickel and Phosphorus dopants into Boron-Carbon alloy thin films

The structural and electronic properties of nickeland phosphorus-doped boron–carbon (B5C) alloy thin films grown by plasma-enhanced chemical vapor deposition have been examined. The Ni-doped boron–carbon alloys were grown using closo-1,2-dicarbadodecaborane (C2B10H12) as the boron–carbon source compound and nickelocene (Ni(C5H5)2) as the nickel source. The phosphorus-doped alloys were grown usi...